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Award Notice SBA 2 notices

Photoresist Direct Write Lithography System N0017325Q0006

Solicitation N0017325Q0006 Copied Notice ID b8efe10107cb4d94a213ebf816ed9d9a Copied DEPT OF DEFENSE — NAVAL RESEARCH LABORATORY
SAM.gov
Posted
Aug 29, 2025
Deadline
No deadline
Set-aside
SBA
NAICS
333242
PSC
3670

Summary

AI-generated · Aug 23, 2025

Procurement of a Photoresist Direct Write Lithography System as described in Attachment 1. This is a combined synopsis/solicitation for commercial items under FAR Part 12; proposals are requested via this RFQ, and no separate written solicitation will be issued. Any changes before the closing date will be issued by amendment posted to Contract Opportunities (beta.sam.gov).

Amendment 0001 provides responses to questions; all other terms remain unchanged. After the closing date, only quoters will receive amendments and will be considered for award. Questions must be submitted to the designated points of contact within 10 days of the posted date.

Amendment 0001 is hereby issued to accomplish the following: 1. Provide responses to questions received. 2. All other terms and conditions remain unchanged. This Request for Quote (RFQ) is for the procurment of a Photoresist Direect Write Lithography System as described in Attachment 1 of this solicitation. This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Federal Acquisition Regulations (FAR) Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. Solicitation documents and incorporated provisions are those in effect through Federal Acquisition Circular 2021-06 and NMCARS 18-18. All changes to this solicitation that occur prior to the closing date will be issued via amendment posted to the announcement on Contract Opportunities (beta.sam.gov). It is the responsibility of interested vendors to monitor the announcement for amendments that may be issued to this solicitation. For changes made after the closing date, only those quoters that provide a quote will be provided any changes/amendments and considered for future discussions and/or award. Questions must be submitted to the Point(s) of Contact listed no later than ten (10) days after the Posted Date.

From Combined Synopsis/Solicitation posted on Jun 25, 2025

This contract is awarded to Raith America Inc. as a total small business set-aside (FAR 19.5), under purchases of Commercial Items IAW FAR part 12 and 13.5 for the procurement of Photoresist Direct Write Lithography System (PWDL).

From Award Notice posted on Aug 29, 2025

Notice history

2
  1. Combined Synopsis/Solicitation Posted Jun 25, 2025 View
  2. Award Notice LATEST Posted Aug 29, 2025

Details

Solicitation number N0017325Q0006
Notice ID b8efe10107cb4d94a213ebf816ed9d9a
Award number N0017325P0057
Notice type Award Notice
Product / Service (PSC) 3670
NAICS 333242
Place of performance USA
Archive date Sep 13, 2025

Award Information

Awardee
1
Total Awarded
$485,800.00
Award Date
Aug 29, 2025

Award Notices

Photoresist Direct Write Lithography System View Notice

Posted: Aug 29, 2025

This contract is awarded to Raith America Inc. as a total small business set-aside (FAR 19.5), under purchases of Commercial Items IAW FAR part 12 and 13.5 for the procurement of Photoresist Direct Write Lithography System (PWDL).

Awardees

Company Name UEI CAGE Code Location
RAITH AMERICA INC PLE9J4EGK5V6 1LK36 Troy, NY

Documents

No files available

View on SAM.gov

Contacts

primary
Tamara Jenkins

Email

Phone

secondary
ARTHUR REGO

Email

Agency

DEPT OF DEFENSE
DEPT OF THE NAVY
ONR
ONR NRL
NAVAL RESEARCH LABORATORY

Place of Performance


USA

Dates

Posted Aug 29, 2025 11 months ago
Last Updated Aug 06, 2026 2 days ago
Awarded Aug 29, 2025 11 months ago