Photolithography Exposure System HT942525PE042
Summary
AI-generated · Sep 28, 2025A photolithography exposure system is required, which can be a mask aligner or a direct laser writer (maskless aligner). It must illuminate a substrate coated with photoresist by passing UV light through an inserted photomask, with precise alignment between the projected pattern and the substrate. The UV wavelength must be compatible with SU-8 photoresist (365 nm). All operating parameters should be digitally controlled via a PLC or an included computer, and created patterns must be repeatable with 2 microns or better resolution. The system must expose an area up to and including a standard 6-wafer size and support both soft and hard contact exposure, suitable for prototyping electrode designs with precise features, and it should not require a clean room to operate.
Awarded to Heidelberg Instruments Inc. for $160,700.
The U.S. Army Medical Research Institute of Chemical Defense (USAMICD) requires a photolithography exposure system which could be a mask aligner or a direct laser writer (also known as a maskless aligner). It shall have a UV light source that passes light through an inserted photomask onto a substrate coated in photoresist. The system shall be able to align this projected pattern precisely with the substrate being exposed. The UV light wavelength shall be compatible with SU-8 photoresist (365nm). Operating parameters shall be digitally controlled with a programmable logic controller system or included computer. Created patterns shall be repeatable with a resolution of 2 microns or less. The system shall be able to expose an area up to and including that of a standard 6 wafer. It shall be capable of both soft and hard contact exposure. The system will be used for prototyping electrode designs with precise features. It should not require a clean room to operate.
From Award Notice posted on Sep 19, 2025Notice history
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Award Notice LATEST Posted Sep 19, 2025
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Award Information
Award Notices
Posted: Sep 19, 2025
The U.S. Army Medical Research Institute of Chemical Defense (USAMICD) requires a photolithography exposure system which could be a mask aligner or a direct laser writer (also known as a maskless aligner). It shall have a UV light source that passes light through an inserted photomask onto a substra...
Awardees
| Company Name | UEI | CAGE Code | Location |
|---|---|---|---|
| HEIDELBERG INSTRUMENTS INC. | UB7PM2A1F9A1 | 35FZ9 | Torrance, CA |
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USA