Interference Lithography Stage System BZ-2025-11

Lawrence Berkeley National Laboratory is conducting market research to identify sources that possess the capabilities and experience necessary to deliver an Interference Lithography Stage System for the Center for X-Ray Optics. The stage system consists of two separate stage assemblies: one will carry standard size silicon wafers, the other will carry a tray of optical gratings. Light will pass through the gratings from above and reach the wafer, which will require the grating mount to be offset from the stage body or to have an open frame stage assembly. The stage system will be enclosed in a vacuum chamber with an operating pressure of 1E-7 Torr. The stages must be built to withstand the vacuum environment with low particle generation and also have minimal outgassing when the chamber is at operating pressure. Please see the attached RFI documents for preliminary specifications and submission instructions.